Modelling RTN and BTI in nanoscale MOSFETs from device to circuit: A review

L. Gerrer*, J. Ding, S. M. Amoroso, F. Adamu-Lema, R. Hussin, D. Reid, C. Millar, A. Asenov

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

38 Citations (Scopus)

Abstract

In this paper we summarize the impact of Statistical Variability (SV) on device performances and study the impact of oxide trapped charges in combination with SV. Traps time constants are described and analysed in combination with SV and time dependent simulations are performed including SV, random traps and charge injection stochasticity. Finally we demonstrate the necessity of statistical simulations in extracting compact models of aged devices and we address the problem of aged SRAM cell reliability.

Original languageEnglish
Pages (from-to)682-697
Number of pages16
JournalMicroelectronics Reliability
Volume54
Issue number4
DOIs
Publication statusPublished - Apr 2014
Externally publishedYes

Fingerprint

Dive into the research topics of 'Modelling RTN and BTI in nanoscale MOSFETs from device to circuit: A review'. Together they form a unique fingerprint.

Cite this