Micro/nano grating and its application to moiré measurement

Huimin Xie; Zhanwei Liu; Haixia Shang; Qikun Xue; Jinfeng Jia; Daining Fang

doi:10.1117/12.621896

Micro/nano grating and its application to moiré measurement

Huimin Xie^*
, Zhanwei Liu
, Haixia Shang
, Qikun Xue
, Jinfeng Jia
, Daining Fang

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

Abstract

In this paper, some novel micro/nano- moiré grating fabricating techniques are introduced. The gratings are produced by the SPM lithography, FIB lithography, and molecular beam epitaxy (MBE) method. The moiré patterns formed with these gratings are also introduced. The gratings are successfully to be used to measure the residual deformation in the surface around a step edge of the Al/Si artificial nanocluster with the moiré methods. The successful experimental results verify the feasibility of these methods.

Original language	English
Article number	118
Pages (from-to)	740-744
Number of pages	5
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5852 PART II
DOIs	https://doi.org/10.1117/12.621896
Publication status	Published - 2005
Externally published	Yes
Event	Third International Conference on Experimental Mechanics and Third Conference of the Asian Committee on Experimental Mechanics - Singapore, Singapore Duration: 29 Nov 2004 → 1 Dec 2004

Keywords

FEB lithography
Nano- moiré
Nano-grating
SPM lithography

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10.1117/12.621896

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@article{64ba855ce8a2434591695aaf5405d4c7,

title = "Micro/nano grating and its application to moir{\'e} measurement",

abstract = "In this paper, some novel micro/nano- moir{\'e} grating fabricating techniques are introduced. The gratings are produced by the SPM lithography, FIB lithography, and molecular beam epitaxy (MBE) method. The moir{\'e} patterns formed with these gratings are also introduced. The gratings are successfully to be used to measure the residual deformation in the surface around a step edge of the Al/Si artificial nanocluster with the moir{\'e} methods. The successful experimental results verify the feasibility of these methods.",

keywords = "FEB lithography, Nano- moir{\'e}, Nano-grating, SPM lithography",

author = "Huimin Xie and Zhanwei Liu and Haixia Shang and Qikun Xue and Jinfeng Jia and Daining Fang",

year = "2005",

doi = "10.1117/12.621896",

language = "English",

volume = "5852 PART II",

pages = "740--744",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Third International Conference on Experimental Mechanics and Third Conference of the Asian Committee on Experimental Mechanics ; Conference date: 29-11-2004 Through 01-12-2004",

}

TY - JOUR

T1 - Micro/nano grating and its application to moiré measurement

AU - Xie, Huimin

AU - Liu, Zhanwei

AU - Shang, Haixia

AU - Xue, Qikun

AU - Jia, Jinfeng

AU - Fang, Daining

PY - 2005

Y1 - 2005

N2 - In this paper, some novel micro/nano- moiré grating fabricating techniques are introduced. The gratings are produced by the SPM lithography, FIB lithography, and molecular beam epitaxy (MBE) method. The moiré patterns formed with these gratings are also introduced. The gratings are successfully to be used to measure the residual deformation in the surface around a step edge of the Al/Si artificial nanocluster with the moiré methods. The successful experimental results verify the feasibility of these methods.

AB - In this paper, some novel micro/nano- moiré grating fabricating techniques are introduced. The gratings are produced by the SPM lithography, FIB lithography, and molecular beam epitaxy (MBE) method. The moiré patterns formed with these gratings are also introduced. The gratings are successfully to be used to measure the residual deformation in the surface around a step edge of the Al/Si artificial nanocluster with the moiré methods. The successful experimental results verify the feasibility of these methods.

KW - FEB lithography

KW - Nano- moiré

KW - Nano-grating

KW - SPM lithography

UR - https://www.scopus.com/pages/publications/28444449509

U2 - 10.1117/12.621896

DO - 10.1117/12.621896

M3 - Conference article

AN - SCOPUS:28444449509

SN - 0277-786X

VL - 5852 PART II

SP - 740

EP - 744

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

M1 - 118

T2 - Third International Conference on Experimental Mechanics and Third Conference of the Asian Committee on Experimental Mechanics

Y2 - 29 November 2004 through 1 December 2004

ER -

Micro/nano grating and its application to moiré measurement

Abstract

Keywords

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