Measurement of optical mirror with a small-aperture interferometer

Ya Gao; Hon Yuen Tam; Yongfu Wen; Huijing Zhang; Haobo Cheng

doi:10.1007/s12200-012-0233-6

Measurement of optical mirror with a small-aperture interferometer

Ya Gao, Hon Yuen Tam, Yongfu Wen, Huijing Zhang, Haobo Cheng^*

^*Corresponding author for this work

School of Optics and Photonics

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement.

Original language	English
Pages (from-to)	218-223
Number of pages	6
Journal	Frontiers of Optoelectronics
Volume	5
Issue number	2
DOIs	https://doi.org/10.1007/s12200-012-0233-6
Publication status	Published - Jun 2012

Keywords

interferometry
residual error
subaperture stitching

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10.1007/s12200-012-0233-6

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abstract = "In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement.",

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AU - Gao, Ya

AU - Tam, Hon Yuen

AU - Wen, Yongfu

AU - Zhang, Huijing

AU - Cheng, Haobo

PY - 2012/6

Y1 - 2012/6

N2 - In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement.

AB - In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement.

KW - interferometry

KW - residual error

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Measurement of optical mirror with a small-aperture interferometer

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Keywords

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