Abstract
Extreme ultraviolet lithography is one of the promising technologies for 16~22 nm node of lithography. Design of the extreme ultraviolet lithographic projection objective needs not only to meet the demand of imaging quality and resolution but also to consider the manufacturability. Two projection objectives with numerical apertures of 0.3 and 0.32, respectively, are designed in the 26 mm×1.5 mm exposure area to meet the demands of manufacture, measurement and fabrication. The optical performance and manufacturability of the two projection objectives are analyzed and compared in detail. Combining with the resolution enhancement technology, the two projection objectives can meet the requirements of 22 nm and 16 nm node of lithography.
| Original language | English |
|---|---|
| Pages (from-to) | 922005 |
| Number of pages | 1 |
| Journal | Guangxue Xuebao/Acta Optica Sinica |
| Volume | 33 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - Sept 2013 |
Keywords
- Catoptric system
- Extreme ultraviolet lithography
- Optical design
- Projection objective