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Large-scale lithography-free metasurface with spectrally tunable super absorption

  • Kai Liu
  • , Xie Zeng
  • , Suhua Jiang
  • , Dengxin Ji
  • , Haomin Song
  • , Nan Zhang
  • , Qiaoqiang Gan*
  • *Corresponding author for this work
  • SUNY Buffalo
  • Fudan University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We demonstrate a simple, low-cost and large-area lithography-free method to fabricate three-layered metasurface structures with tunable, broadband and omnidirectional absorption properties.

Original languageEnglish
Title of host publicationCLEO
Subtitle of host publicationQELS_Fundamental Science, CLEO_QELS 2014
PublisherOptical Society of America (OSA)
ISBN (Print)9781557529992, 9781557529992
DOIs
Publication statusPublished - 2014
Externally publishedYes
EventCLEO: QELS_Fundamental Science, CLEO_QELS 2014 - San Jose, CA, United States
Duration: 8 Jun 201413 Jun 2014

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceCLEO: QELS_Fundamental Science, CLEO_QELS 2014
Country/TerritoryUnited States
CitySan Jose, CA
Period8/06/1413/06/14

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