Large-Area and High-Quality 2D Transition Metal Telluride

  • Jiadong Zhou
  • , Fucai Liu
  • , Junhao Lin*
  • , Xiangwei Huang
  • , Juan Xia
  • , Bowei Zhang
  • , Qingsheng Zeng
  • , Hong Wang
  • , Chao Zhu
  • , Lin Niu
  • , Xuewen Wang
  • , Wei Fu
  • , Peng Yu
  • , Tay Rong Chang
  • , Chuang Han Hsu
  • , Di Wu
  • , Horng Tay Jeng
  • , Yizhong Huang
  • , Hsin Lin
  • , Zexiang Shen
  • Changli Yang, Li Lu, Kazu Suenaga, Wu Zhou, Sokrates T. Pantelides, Guangtong Liu, Zheng Liu
*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

245 Citations (Scopus)

Abstract

Large-scale and atom-thin ditellurides including WTe2 and MoTe2 were synthesized. The Te powder was used as the Te sources. The crystals were synthesized in quartz tube with temperature from 700 to 850°C. Specifically, for the WTe2, the mixed gas of H2/Ar with 15 and 150 sccm was used as the carrier gas, the silicon boat containing 30 mg mixed powders with WO3:WCl6:Te =1:1:1(weight ratio) was put in the center of the tube. The SiO2/Si substrate was placed downstream. Another silicon boat containing 0.5 g Te powder was put on the upstream. The temperature ramped up to the 780°C in 16 min, and kept at the reaction temperature for about 5 to 15 min. Then, the furnace cooled down to room temperature gradually. Raman spectroscopy was employed to characterize the quality of the WTe2 and MoTe2 atomic layers. The result shows the Raman spectra of WTe2 films with different thicknesses ranging from monolayer to bulk. The as-synthesized MoTe2 atomic layer also maintains the 1T2 phase similar to the WTe2 in the monolayer form presented above, while structural difference can be observed in the few layer flakes due to the different interlayer stacking structure.

Original languageEnglish
Article number1603471
JournalAdvanced Materials
Volume29
Issue number3
DOIs
Publication statusPublished - Jan 2017
Externally publishedYes

Keywords

  • 2D materials
  • MoTe
  • WTe
  • chemical vapor deposition

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