Kinetics study of aluminium deposition on inner wall of pipes by atomic layer deposition

Heng Liu, Yuqing Xiong*, Jizhou Wang

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

In this paper, feasibility of aluminium deposition on inner wall of pipes by atomic layer deposition was studied. Firstly, by solving kinetics equation of gas adsorption on the pipe inner wall, the time for the reactant to reach saturated adsorption on the wall was calculated. Secondly, according to the aluminium crystal structure, the thickness of each deposition cycle was obtained. Finally, the minimum aluminium thickness and number of atomic layer deposition cycles that can meet electromagnetic requirement of wave guide was calculated.

Original languageEnglish
Pages (from-to)627-632
Number of pages6
JournalAdvanced Materials Research
Volume482-484
DOIs
Publication statusPublished - 2012
Externally publishedYes
Event3rd international Conference on Manufacturing Science and Engineering, ICMSE 2012 - Xiamen, China
Duration: 27 Mar 201229 Mar 2012

Keywords

  • Aluminium
  • Atomic layer deposition
  • Inner wall
  • Pipe
  • Waveguide

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