Investigation on direct-gap GeSn alloys for high-performance tunneling field-effect transistor applications

  • Lei Liu
  • , Renrong Liang
  • , Guilei Wang
  • , Henry H. Radamson
  • , Jing Wang
  • , Jun Xu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

GeSn alloys are investigated for high-performance tunneling device applications. Samples with relatively high Sn compositions are characterized. GeSn electronic band structures are calculated and basic material parameters are extracted. Based on the established GeSn parameter sets, direct-gap GeSn tunneling field-effect transistors are simulated and analyzed. A higher Sn composition enhances device performance, but subthreshold swing is affected by the increased leakage level. For ultra small supply voltages, device structure should be optimized to improve device characteristics.

Original languageEnglish
Title of host publication2017 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2017 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages180-181
Number of pages2
ISBN (Electronic)9781509046591
DOIs
Publication statusPublished - 13 Jun 2017
Externally publishedYes
Event2017 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2017 - Toyama, Japan
Duration: 28 Feb 20172 Mar 2017

Publication series

Name2017 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2017 - Proceedings

Conference

Conference2017 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2017
Country/TerritoryJapan
CityToyama
Period28/02/172/03/17

Keywords

  • GeSn alloys
  • tunneling FETs and electronic band structures

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