Abstract
The design and fabrication of a micro polarizer array (MPA) for polarization imaging is described for visible-IR region. The MPA, composed of 1280 × 1024 elements, is designed to be integrated directly onto the CMOS chip. Each micro polarizer consists of a 200-nm-period Al wire grating with the dimension of 5.2 μm × 5.2 μm, and the performance of gratings with finite number of periods and gradient ridge-length has been thoroughly investigated. The grating ridge of each polarizer orients four different directions offset by 45° which determines different polarization directions correspondingly. Initial test and experiment for the MPA are performed and the crosstalk caused by diffraction is discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 1427-1435 |
| Number of pages | 9 |
| Journal | Optik |
| Volume | 158 |
| DOIs | |
| Publication status | Published - Apr 2018 |
| Externally published | Yes |
Keywords
- Micro polarizer array
- Polarimetric imaging
- Subwavelength gratings
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