Abstract
Diamond-like carbon films are prepared on silicon by pulse-arc plasma deposition. By means of orthogonal test method and scratch test technique, the relationships between adhesion of the deposited films and deposition parameters have been systematically analyzed. The results show that the substrate temperature, the voltage U across the interelectrode and the frequency of pulse greatly effect adhesion of the deposited films. The adhesion is strengthened with increasing substrate temperature and decreasing voltage across the interelectrode. A threshold frequency exists in dependence of adhesion of the deposited films on the frequency. The scratch test also indicates that intensive internal stress plays an important role in the adhesion of diamond-like carbon film.
| Original language | English |
|---|---|
| Pages (from-to) | 92-95 |
| Number of pages | 4 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 3557 |
| Publication status | Published - 1998 |
| Externally published | Yes |
| Event | Proceedings of the 1998 Conference on Current Developments in Optical Elements and Manufacturing - Beijing, China Duration: 16 Sept 1998 → 18 Sept 1998 |