In situ X-ray reflectivity study of imprint in ferroelectric thin films

Jiang Li Cao*, Kai Zhang, Axel Solbach, Zhenxing Yue, Huang Hua Wang, Yu Chen, Uwe Klemradt

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Citations (Scopus)

Abstract

The structural origin of imprint in Pb(Zr,Ti)O3 (PZT) ferroelectric thin films derived by chemical solution deposition with Pt top and bottom electrodes was studied by in-situ high-resolution X-ray specular reflectivity of synchrotron radiation. Global structural parameters of density, thickness, and surface or interface roughness of each component layer in the thin film sample were obtained. No generation of interfacial layers with a different electron density from PZT and no interface roughening were observed at the interfaces of PZT and Pt during imprint. Thus, the results suggest that the imprint effect is more likely a bulk or electronic defects-related phenomenon.

Original languageEnglish
Title of host publicationFunctional and Electronic Materials
PublisherTrans Tech Publications Ltd.
Pages292-296
Number of pages5
ISBN (Print)9783037851692
DOIs
Publication statusPublished - 2011
Externally publishedYes

Publication series

NameMaterials Science Forum
Volume687
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Keywords

  • Ferroelectric thin films
  • Imprint
  • Lead zirconate titanate
  • X-ray reflectivity

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