In situ monitoring system for manufacturing atomic vapor cells with anti-relaxation coatings

Atomic vapor cells with anti-relaxation coatings (ARCs) are critical components in atomic devices, such as atomic clocks and atomic magnetometers. However, widespread adoption of these vapor cells is hindered by poor performance convergence and limited manufacturing yields, stemming from the lack of systematic preparation protocols. Herein, we present an in situ monitoring system that enables real-time optimization of the spin coherence time and vapor density during the preparation of ARC vapor cells. By integrating real-time process monitoring and closed loop feedback control into cell curing, our system dynamically adjusts the curing parameters to optimize the spin coherence time to an order of magnitude of seconds. The proposed system can potentially improve the manufacturing yield of ARC vapor cells and provides a foundational platform for the advancement of quantum sensors.