High solid loading, low viscosity photosensitive Al2O3 slurry for stereolithography based additive manufacturing

Keqiang Zhang, Chen Xie, Gang Wang, Rujie He*, Guojiao Ding, Min Wang, Dawei Dai, Daining Fang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

255 Citations (Scopus)

Abstract

Photosensitive Al2O3-resin slurries with high solid loading, low viscosity used for stereolithography based additive manufacturing were prepared in this paper. The dispersion behavior and rheological behavior of the Al2O3-resin slurries were studied by rheology observation and sedimentation tests. The dispersant type, concentration and solid loading had significant effects on the rheological behavior and stability of the photosensitive Al2O3-resin slurries. A long term stability and homogeneity slurry was obtained when the dispersant and concentration were KOS110 and 5 wt%, respectively. The Al2O3 slurry prepared with a high solid loading up to 60 vol%, low viscosity of 15.4 Pa s at 200 s−1 was chosen for stereolithography based additive manufacturing.

Original languageEnglish
Pages (from-to)203-208
Number of pages6
JournalCeramics International
Volume45
Issue number1
DOIs
Publication statusPublished - Jan 2019

Keywords

  • Additive manufacturing
  • Dispersion
  • Rheology
  • Solid loading

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