High Performance Terahertz Metamaterials based on Dynamic Projection Scanning Lithography

T Conventional microfabrication techniques enable micro-and nanoscale structuring but face critical limitations in the precise fabrication of terahertz (THz) metamaterials, especially on large-Area substrates with complex, high-Aspect-ratio features. Traditional lithography struggles to achieve the subwavelength resolution required at THz frequencies, restricting the functionality of such materials. Here, we present a dynamic projection scanning lithography method that integrates frame-by-frame digital light projection with tailored optical configurations for three-dimensional exposure. By employing a cross-scale strategy, the digital micromirror array dynamically adjusts tilt angles and scanning directions, achieving super-resolution beyond conventional projection limits, having a smallest feature size of 2.0 μm. This approach enables precise fabrication of multi-period, sub-pixel THz metamaterial structures across substrates up to 350 × 350 mm2, while flexibly balancing resolution and processing area. The proposed technique offers a versatile platform for high-performance THz metamaterials, with broad potential in ultraprecise manufacturing, micro/nanodevices, integrated optoelectronics, and biosensing.