@inproceedings{c34d0e6f67764a89a4e293bd4fec1d3b,
title = "High-fidelity curvilinear SRAF method adopting distance-versus-angle-signature",
abstract = "Curvilinear sub-resolution assist features (SRAF) can significantly improve the fidelity of print image in curvilinear optical proximity correction (OPC). However, conventional inverse lithography technology (ILT)-based methods for curvilinear SRAF generation consume substantial computational resources. This paper proposes an efficient distance-versus-angle-signature (DVAS) based method for curvilinear SRAF placement. The proposed method leverages second-order derivative analysis of DVAS to rapidly identify SRAF insertion points. Furthermore, this method employs B-spline to connect these points, and applies morphological dilation operation to ensure constant-width SRAF generation. Simulation results demonstrate that the proposed method effectively places the SRAF and improves imaging performance.",
keywords = "Curvilinear mask, curvilinear optical proximity correction, curvilinear sub-resolution assist features",
author = "Weichen Huang and Yanqiu Li",
note = "Publisher Copyright: {\textcopyright} 2025 SPIE.; 9th International Workshop on Advanced Patterning Solutions, IWAPS 2025 ; Conference date: 14-10-2025 Through 15-10-2025",
year = "2025",
month = dec,
day = "3",
doi = "10.1117/12.3092729",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Yayi Wei and Tianchun Ye",
booktitle = "Ninth International Workshop on Advanced Patterning Solutions, IWAPS 2025",
address = "United States",
}