Graphitic carbon nitride thin films deposited by electrodeposition

Chao Li; Chuan Bao Cao; He Sun Zhu

doi:10.1016/j.matlet.2003.11.024

Graphitic carbon nitride thin films deposited by electrodeposition

Chao Li
, Chuan Bao Cao^*
, He Sun Zhu

^*Corresponding author for this work

School of Material Science and Engineering

Beijing Institute of Technology
Zhengzhou Institute of Technology

Research output: Contribution to journal › Article › peer-review

81 Citations (Scopus)

Abstract

Electrodeposition method was used to deposit the graphitic carbon nitride thin film on Si (100) substrate from a saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-trazine at room temperature. X-ray powder diffraction (XRD) results show that the d-values are in good agreement with the data of graphite-like carbon nitride calculated in the literature. X-ray photoelectron spectra (XPS) measurements indicate the elements in the deposited films were mostly of C and N (N/C=0.88), and N bonded with C in the forms of C-N and C=N bond. The Fourier transform infrared (FTIR) spectroscopy indicates that CN aromatic ring exists in the product. These results demonstrate that crystalline g-C₃N₄ was obtained.

Original language	English
Pages (from-to)	1903-1906
Number of pages	4
Journal	Materials Letters
Volume	58
Issue number	12-13
DOIs	https://doi.org/10.1016/j.matlet.2003.11.024
Publication status	Published - May 2004

Keywords

Carbon nitride
Electrodeposition
Thin films
g-CN

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10.1016/j.matlet.2003.11.024

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title = "Graphitic carbon nitride thin films deposited by electrodeposition",

abstract = "Electrodeposition method was used to deposit the graphitic carbon nitride thin film on Si (100) substrate from a saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-trazine at room temperature. X-ray powder diffraction (XRD) results show that the d-values are in good agreement with the data of graphite-like carbon nitride calculated in the literature. X-ray photoelectron spectra (XPS) measurements indicate the elements in the deposited films were mostly of C and N (N/C=0.88), and N bonded with C in the forms of C-N and C=N bond. The Fourier transform infrared (FTIR) spectroscopy indicates that CN aromatic ring exists in the product. These results demonstrate that crystalline g-C3N4 was obtained.",

keywords = "Carbon nitride, Electrodeposition, Thin films, g-CN",

author = "Chao Li and Cao, \{Chuan Bao\} and Zhu, \{He Sun\}",

year = "2004",

month = may,

doi = "10.1016/j.matlet.2003.11.024",

language = "English",

volume = "58",

pages = "1903--1906",

journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier B.V.",

number = "12-13",

}

TY - JOUR

T1 - Graphitic carbon nitride thin films deposited by electrodeposition

AU - Li, Chao

AU - Cao, Chuan Bao

AU - Zhu, He Sun

PY - 2004/5

Y1 - 2004/5

N2 - Electrodeposition method was used to deposit the graphitic carbon nitride thin film on Si (100) substrate from a saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-trazine at room temperature. X-ray powder diffraction (XRD) results show that the d-values are in good agreement with the data of graphite-like carbon nitride calculated in the literature. X-ray photoelectron spectra (XPS) measurements indicate the elements in the deposited films were mostly of C and N (N/C=0.88), and N bonded with C in the forms of C-N and C=N bond. The Fourier transform infrared (FTIR) spectroscopy indicates that CN aromatic ring exists in the product. These results demonstrate that crystalline g-C3N4 was obtained.

AB - Electrodeposition method was used to deposit the graphitic carbon nitride thin film on Si (100) substrate from a saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-trazine at room temperature. X-ray powder diffraction (XRD) results show that the d-values are in good agreement with the data of graphite-like carbon nitride calculated in the literature. X-ray photoelectron spectra (XPS) measurements indicate the elements in the deposited films were mostly of C and N (N/C=0.88), and N bonded with C in the forms of C-N and C=N bond. The Fourier transform infrared (FTIR) spectroscopy indicates that CN aromatic ring exists in the product. These results demonstrate that crystalline g-C3N4 was obtained.

KW - Carbon nitride

KW - Electrodeposition

KW - Thin films

KW - g-CN

UR - https://www.scopus.com/pages/publications/1642632949

U2 - 10.1016/j.matlet.2003.11.024

DO - 10.1016/j.matlet.2003.11.024

M3 - Article

AN - SCOPUS:1642632949

SN - 0167-577X

VL - 58

SP - 1903

EP - 1906

JO - Materials Letters

JF - Materials Letters

IS - 12-13

ER -

Graphitic carbon nitride thin films deposited by electrodeposition

Abstract

Keywords

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