Free-standing Pt@RuO2·xH2O nanorod arrays on Si wafers as electrodes for methanol electro-oxidation

Guangyu Zhao, Li Zhang, Kening Sun*, Hulin Li

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

RuO2·xH2O nanorod arrays free-standing on Si wafers are prepared by an anodic aluminum oxide template assistant method. Pt nanograins in the size of 3-5 nm are deposited on the RuO2· xH2O nanorod arrays uniformly by a cool sputtering approach. Electrochemical measurements indicate that, the Pt@RuO2· xH2O nanorod arrays have larger electrochemical active areas (EAAs) and better poisoning resistant ability for methanol electro-oxidation, compared with Pt nanograins that deposited on Ti wafers directly (named Pt/Ti). The EAAs of Pt@RuO2·xH2O and Pt/Ti electrodes are 40.6 and 31.1 m2 g-1, respectively. The poisoning rate of Pt@RuO2·xH2O arrays is 8.9 × 10-4% per second, much smaller than that of Pt/Ti electrodes (3.4 × 10 -3% per second).

Original languageEnglish
Pages (from-to)892-897
Number of pages6
JournalJournal of Power Sources
Volume245
DOIs
Publication statusPublished - 2014
Externally publishedYes

Keywords

  • Anodic aluminum oxide template
  • Electro-catalysis
  • Nanorod array
  • Poisoning rate
  • Silicon wafer

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