Abstract
RuO2·xH2O nanorod arrays free-standing on Si wafers are prepared by an anodic aluminum oxide template assistant method. Pt nanograins in the size of 3-5 nm are deposited on the RuO2· xH2O nanorod arrays uniformly by a cool sputtering approach. Electrochemical measurements indicate that, the Pt@RuO2· xH2O nanorod arrays have larger electrochemical active areas (EAAs) and better poisoning resistant ability for methanol electro-oxidation, compared with Pt nanograins that deposited on Ti wafers directly (named Pt/Ti). The EAAs of Pt@RuO2·xH2O and Pt/Ti electrodes are 40.6 and 31.1 m2 g-1, respectively. The poisoning rate of Pt@RuO2·xH2O arrays is 8.9 × 10-4% per second, much smaller than that of Pt/Ti electrodes (3.4 × 10 -3% per second).
| Original language | English |
|---|---|
| Pages (from-to) | 892-897 |
| Number of pages | 6 |
| Journal | Journal of Power Sources |
| Volume | 245 |
| DOIs | |
| Publication status | Published - 2014 |
| Externally published | Yes |
Keywords
- Anodic aluminum oxide template
- Electro-catalysis
- Nanorod array
- Poisoning rate
- Silicon wafer