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Formation and growth of stacking fault tetrahedra in Ni via vacancy aggregation mechanism

  • Dilpuneet S. Aidhy*
  • , Chenyang Lu
  • , Ke Jin
  • , Hongbin Bei
  • , Yanwen Zhang
  • , Lumin Wang
  • , William J. Weber
  • *Corresponding author for this work
  • University of Wyoming
  • Oak Ridge National Laboratory
  • University of Michigan, Ann Arbor
  • University of Tennessee, Knoxville

Research output: Contribution to journalArticlepeer-review

Abstract

Using molecular dynamics simulations, the formation and growth of stacking fault tetrahedra (SFT) are captured by vacancy cluster diffusion and aggregation mechanisms in Ni. The vacancy-tetrahedron acts as a nucleation point for SFT formation. Simulations show that perfect SFT can grow to the next size perfect SFT via a vacancy aggregation mechanism. The stopping and range of ions in matter (SRIM) calculations and transmission electron microscopy (TEM) observations reveal that SFT can form farther away from the initial cascade-event locations, indicating the operation of diffusion-based vacancy-aggregation mechanism.

Original languageEnglish
Pages (from-to)137-141
Number of pages5
JournalScripta Materialia
Volume114
DOIs
Publication statusPublished - 15 Mar 2016
Externally publishedYes

Keywords

  • Diffusion
  • Molecular dynamics
  • Point defect
  • Stacking fault tetrahedra

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