@inproceedings{9aca9bb74ab44137a008e82be245311d,
title = "Fast curvilinear optical proximity correction adopting quasi-uniform B-spline curves",
abstract = "Curvilinear mask has better lithography imaging fidelity than rectilinear mask. However, the mask data volume has limited its practical application. Curvilinear optical proximity correction (OPC) outputs much smaller curvilinear mask file sizes than conventional inverse lithography technology (ILT). The existing Curvilinear OPC methods consume a large amount of computing resources. This paper proposes a Curvilinear OPC method adopting quasi-uniform B-spline curves to improve the optimization efficiency. The mask control points (MCP) are set by equidistant contour sampling method. Then these MCPs are connected by a closed quasi-uniform B-spline (QUBS) curve to represent the curvilinear mask. Besides, the curvilinear mask is optimized by particle swarm optimization (PSO) algorithm. Simulation results show that the proposed Curvilinear OPC method can significantly improve the optimization efficiency.",
keywords = "Curvilinear mask, curvilinear optical proximity correction, optimization efficiency, quasi-uniform B-spline curve",
author = "He Yang and Zhen Li and Miao Yuan and Zhaoxuan Li and Yanqiu Li",
note = "Publisher Copyright: {\textcopyright} 2024 SPIE.; 8th International Workshop on Advanced Patterning Solutions, IWAPS 2024 ; Conference date: 15-10-2024 Through 16-10-2024",
year = "2024",
doi = "10.1117/12.3052949",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Yayi Wei and Tianchun Ye",
booktitle = "Eighth International Workshop on Advanced Patterning Solutions, IWAPS 2024",
address = "United States",
}