Abstract
A series of metal polyhedral oligomeric silsesquioxane salts (POSS-M, M = Li or Na or K) were facilely synthesized using the click reaction and neutralization reaction. The chemical structure of POSS-M was confirmed by FT-IR, 1H, 13C, 29Si NMR, and XRD patterns. The well-characterized POSS-M was introduced into epoxy resins. The epoxy composites containing POSS-Na achieved the UL-94 V1 rating, and the highest LOI value also came from EP/POSS-Na, which was 27.4%. A dramatical decrease in pHRR was observed in all three composites. With 3 wt % POSS-M, the pHRR of epoxy composites dropped by up to 64.2%. Notably, compact char layers with sodium silicate on the surface were clearly observed for the first time, extending the silicon-containing flame retardant mechanism.
| Original language | English |
|---|---|
| Pages (from-to) | 3848-3857 |
| Number of pages | 10 |
| Journal | ACS Applied Polymer Materials |
| Volume | 5 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 12 May 2023 |
Keywords
- epoxy resins
- flame retardant mechanism
- peak heat release rate
- phosphoric triamide
- polyhedral oligomeric silsesquioxane
Fingerprint
Dive into the research topics of 'Facile Synthesis of Alkali Metal Polyhedral Oligomeric Silsesquioxane Salt and Its Application in Flame-Retardant Epoxy Resins'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver