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Fabrication and plasmas-relevant properties of B4C /Cu coating FGM

  • Chuan Sun
  • , Yun Kai Li
  • , Hu Wang
  • , Chang Chun Ge
  • Beijing Institute of Technology
  • Hong Kong University of Science and Technology
  • University of Science and Technology Beijing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

In this work, two kinds of boron carbide coating based on copper substrates, which are non-FGM B4C/Cu coating and FGM B4C/Cu coating, have been fabricated successfully. It is found that the chemical sputtering yield of B4C measures by LAS2000 apparatus is much lower than that of SMF800 graphite under the conditions of 3keV, 4.6E 15D+ /s/cm2 irradiation, and that FGM-B4C coating has much better performance than non-FGM-B4C coating in thermal shock tests. Thermal desorption performance and physical sputtering damage after plasma irradiation are also evaluated.

Original languageEnglish
Title of host publicationDianchi Advanced Materials Forum 2013
Pages257-260
Number of pages4
DOIs
Publication statusPublished - 2014
Event2013 Dianchi Advanced Materials Forum - Kunming, China
Duration: 23 Jul 2013 → 25 Jul 2013

Publication series

NameAdvanced Materials Research
Volume833
ISSN (Print)1022-6680

Conference

Conference2013 Dianchi Advanced Materials Forum
Country/TerritoryChina
CityKunming
Period23/07/13 → 25/07/13

Keywords

  • Coating
  • FGM
  • Plasma irradiation

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