Exceptional-Surface-Tailored Robust Microlaser

Kun Liao, Yangguang Zhong, Zhuochen Du, Guodong Liu, Chentong Li, Xianxin Wu, Chunhua Deng, Cuicui Lu, Xingyuan Wang, Che Ting Chan*, Qinghai Song*, Shufeng Wang*, Xinfeng Liu*, Xiaoyong Hu*, Qihuang Gong

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

Abstract

We report a scalable strategy to realize a robust on-chip integrated microlaser source with simultaneous in-plane emission, linewidth compression, and pump energy utilization improvement based on different orders of exceptional surfaces (ESs).

Original languageEnglish
Publication statusPublished - 2024
EventCLEO: Science and Innovations in CLEO 2024, CLEO: S and I 2024 - Part of Conference on Lasers and Electro-Optics - Charlotte, United States
Duration: 5 May 202410 May 2024

Conference

ConferenceCLEO: Science and Innovations in CLEO 2024, CLEO: S and I 2024 - Part of Conference on Lasers and Electro-Optics
Country/TerritoryUnited States
CityCharlotte
Period5/05/2410/05/24

Fingerprint

Dive into the research topics of 'Exceptional-Surface-Tailored Robust Microlaser'. Together they form a unique fingerprint.

Cite this