Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: A combined experimental and theoretical study

Xueqiang Zhang; Chen Guang Wang; Wei Ji; Sylwia Ptasinska

doi:10.1039/c6cc09961k

Evolution of CH₃NO₂/Si interfacial chemistry under reaction conditions: A combined experimental and theoretical study

Xueqiang Zhang
, Chen Guang Wang
, Wei Ji^*
, Sylwia Ptasinska

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Dissociative adsorption of CH₃NO₂ onto a Si(100)-2 × 1 surface is studied using ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) and density functional theory (DFT) calculations. The unprecedented scission of the C-N bond in CH₃NO₂ and the formation of a Si-CH₃ surface species are observed at elevated CH₃NO₂ pressure (0.5 mbar) and temperature (>573 K).

Original language	English
Pages (from-to)	3342-3345
Number of pages	4
Journal	Chemical Communications
Volume	53
Issue number	23
DOIs	https://doi.org/10.1039/c6cc09961k
Publication status	Published - 2017
Externally published	Yes

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title = "Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: A combined experimental and theoretical study",

abstract = "Dissociative adsorption of CH3NO2 onto a Si(100)-2 × 1 surface is studied using ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) and density functional theory (DFT) calculations. The unprecedented scission of the C-N bond in CH3NO2 and the formation of a Si-CH3 surface species are observed at elevated CH3NO2 pressure (0.5 mbar) and temperature (>573 K).",

author = "Xueqiang Zhang and Wang, \{Chen Guang\} and Wei Ji and Sylwia Ptasinska",

note = "Publisher Copyright: {\textcopyright} 2016 The Royal Society of Chemistry.",

year = "2017",

doi = "10.1039/c6cc09961k",

language = "English",

volume = "53",

pages = "3342--3345",

journal = "Chemical Communications",

issn = "1359-7345",

publisher = "Royal Society of Chemistry",

number = "23",

}

TY - JOUR

T1 - Evolution of CH3NO2/Si interfacial chemistry under reaction conditions

T2 - A combined experimental and theoretical study

AU - Zhang, Xueqiang

AU - Wang, Chen Guang

AU - Ji, Wei

AU - Ptasinska, Sylwia

PY - 2017

Y1 - 2017

N2 - Dissociative adsorption of CH3NO2 onto a Si(100)-2 × 1 surface is studied using ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) and density functional theory (DFT) calculations. The unprecedented scission of the C-N bond in CH3NO2 and the formation of a Si-CH3 surface species are observed at elevated CH3NO2 pressure (0.5 mbar) and temperature (>573 K).

AB - Dissociative adsorption of CH3NO2 onto a Si(100)-2 × 1 surface is studied using ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) and density functional theory (DFT) calculations. The unprecedented scission of the C-N bond in CH3NO2 and the formation of a Si-CH3 surface species are observed at elevated CH3NO2 pressure (0.5 mbar) and temperature (>573 K).

UR - https://www.scopus.com/pages/publications/85015450357

U2 - 10.1039/c6cc09961k

DO - 10.1039/c6cc09961k

M3 - Article

C2 - 28197573

AN - SCOPUS:85015450357

SN - 1359-7345

VL - 53

SP - 3342

EP - 3345

JO - Chemical Communications

JF - Chemical Communications

IS - 23

ER -

Evolution of CH₃NO₂/Si interfacial chemistry under reaction conditions: A combined experimental and theoretical study

Abstract

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