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Erratum: Single β -Ga2O3nanowire based lateral FinFET on Si (Appl. Phys. Lett. (2022) 120 (153501) DOI: 10.1063/5.0086909)

  • Siyuan Xu
  • , Lining Liu
  • , Guangming Qu
  • , Xingfei Zhang
  • , Chunyang Jia
  • , Songhao Wu
  • , Yuanxiao Ma
  • , Young Jin Lee
  • , Guodong Wang
  • , Ji Hyeon Park*
  • , Yiyun Zhang*
  • , Xiaoyan Yi
  • , Yeliang Wang
  • , Jinmin Li
  • *Corresponding author for this work
  • CAS - Institute of Semiconductors
  • University of Chinese Academy of Sciences
  • Beijing Institute of Technology
  • Henan Polytechnic University
  • Korea Institute of Ceramic Engineering And Technology

Research output: Contribution to journalComment/debate

Abstract

In the original published article,1 there was a typing error in Eq. (3). Equation (3) is correct as it appears below: A = qαlH /VGS- VthCG. The error is present only in the equation; none of the figures, discussions, or results in the paper are affected.

Original languageEnglish
Article number089901
JournalApplied Physics Letters
Volume122
Issue number8
DOIs
Publication statusPublished - 20 Feb 2023

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