Erratum: Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692))

Xu Ma; Gonzalo R. Arce

doi:10.1364/JOSAA.27.000082

Erratum: Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692))

Xu Ma^*
, Gonzalo R. Arce

^*Corresponding author for this work

University of Delaware

Research output: Contribution to journal › Comment/debate

4 Citations (Scopus)

Original language	English
Pages (from-to)	82-84
Number of pages	3
Journal	Journal of the Optical Society of America A: Optics and Image Science, and Vision
Volume	27
Issue number	1
DOIs	https://doi.org/10.1364/JOSAA.27.000082
Publication status	Published - 1 Jan 2010
Externally published	Yes

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10.1364/JOSAA.27.000082

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Ma, X., & Arce, G. R. (2010). Erratum: Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692)). Journal of the Optical Society of America A: Optics and Image Science, and Vision, 27(1), 82-84. https://doi.org/10.1364/JOSAA.27.000082

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title = "Erratum: Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692))",

author = "Xu Ma and Arce, \{Gonzalo R.\}",

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Ma, X & Arce, GR 2010, 'Erratum: Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692))', Journal of the Optical Society of America A: Optics and Image Science, and Vision, vol. 27, no. 1, pp. 82-84. https://doi.org/10.1364/JOSAA.27.000082

Erratum: Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692)). / Ma, Xu; Arce, Gonzalo R.
In: Journal of the Optical Society of America A: Optics and Image Science, and Vision, Vol. 27, No. 1, 01.01.2010, p. 82-84.

Research output: Contribution to journal › Comment/debate

TY - JOUR

T1 - Erratum

T2 - Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692))

AU - Ma, Xu

AU - Arce, Gonzalo R.

PY - 2010/1/1

Y1 - 2010/1/1

UR - https://www.scopus.com/pages/publications/75149146459

U2 - 10.1364/JOSAA.27.000082

DO - 10.1364/JOSAA.27.000082

M3 - Comment/debate

AN - SCOPUS:75149146459

SN - 1084-7529

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EP - 84

JO - Journal of the Optical Society of America A: Optics and Image Science, and Vision

JF - Journal of the Optical Society of America A: Optics and Image Science, and Vision

IS - 1

ER -

Erratum: Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692))

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