Epitaxial growth of highly symmetrical branched noble metal-semiconductor heterostructures with efficient plasmon-induced hot-electron transfer

  • Li Zhai
  • , Sara T. Gebre
  • , Bo Chen
  • , Dan Xu
  • , Junze Chen
  • , Zijian Li
  • , Yawei Liu
  • , Hua Yang
  • , Chongyi Ling
  • , Yiyao Ge
  • , Wei Zhai
  • , Changsheng Chen
  • , Lu Ma
  • , Qinghua Zhang
  • , Xuefei Li
  • , Yujie Yan
  • , Xinyu Huang
  • , Lujiang Li
  • , Zhiqiang Guan
  • , Chen Lei Tao
  • Zhiqi Huang, Hongyi Wang, Jinze Liang, Ye Zhu, Chun Sing Lee, Peng Wang, Chunfeng Zhang, Lin Gu, Yonghua Du, Tianquan Lian*, Hua Zhang*, Xue Jun Wu*
*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

39 Citations (Scopus)

Abstract

Epitaxial growth is one of the most commonly used strategies to precisely tailor heterostructures with well-defined compositions, morphologies, crystal phases, and interfaces for various applications. However, as epitaxial growth requires a small interfacial lattice mismatch between the components, it remains a challenge for the epitaxial synthesis of heterostructures constructed by materials with large lattice mismatch and/or different chemical bonding, especially the noble metal-semiconductor heterostructures. Here, we develop a noble metal-seeded epitaxial growth strategy to prepare highly symmetrical noble metal-semiconductor branched heterostructures with desired spatial configurations, i.e., twenty CdS (or CdSe) nanorods epitaxially grown on twenty exposed (111) facets of Ag icosahedral nanocrystal, albeit a large lattice mismatch (more than 40%). Importantly, a high quantum yield (QY) of plasmon-induced hot-electron transferred from Ag to CdS was observed in epitaxial Ag-CdS icosapods (18.1%). This work demonstrates that epitaxial growth can be achieved in heterostructures composed of materials with large lattice mismatches. The constructed epitaxial noble metal-semiconductor interfaces could be an ideal platform for investigating the role of interfaces in various physicochemical processes.

Original languageEnglish
Article number2538
JournalNature Communications
Volume14
Issue number1
DOIs
Publication statusPublished - Dec 2023
Externally publishedYes

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