TY - GEN
T1 - Enhanced performance of Ag-filament threshold switching selector by rapid thermal processing
AU - Hua, Qilin
AU - Wu, Huaqiang
AU - Gao, Bin
AU - Qian, He
N1 - Publisher Copyright:
© 2018 IEEE.
PY - 2018/7/3
Y1 - 2018/7/3
N2 - Selector devices are typically employed to suppress sneak path currents in RRAM array. Here, we demonstrate a bidirectional Ag- filament threshold switching (TS) selector with an enhanced performance of large selectivity over 108 and high on-state current beyond 100 μA through rapid thermal processing (RTP). The TS selector has more than 100 M cycles endurance and can remain stable switching even when ambient temperature is up to 200°C. The mechanism of the TS selector is analyzed to explain the bidirectional selector characteristics. Indeed, this TS selector would be a good candidate for 1S1R configuration and future high-density 3D RRAM integration.
AB - Selector devices are typically employed to suppress sneak path currents in RRAM array. Here, we demonstrate a bidirectional Ag- filament threshold switching (TS) selector with an enhanced performance of large selectivity over 108 and high on-state current beyond 100 μA through rapid thermal processing (RTP). The TS selector has more than 100 M cycles endurance and can remain stable switching even when ambient temperature is up to 200°C. The mechanism of the TS selector is analyzed to explain the bidirectional selector characteristics. Indeed, this TS selector would be a good candidate for 1S1R configuration and future high-density 3D RRAM integration.
UR - http://www.scopus.com/inward/record.url?scp=85050506733&partnerID=8YFLogxK
U2 - 10.1109/VLSI-TSA.2018.8403855
DO - 10.1109/VLSI-TSA.2018.8403855
M3 - Conference contribution
AN - SCOPUS:85050506733
T3 - 2018 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2018
SP - 1
EP - 2
BT - 2018 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2018
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2018 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2018
Y2 - 16 April 2018 through 19 April 2018
ER -