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Enhanced electrical stability of flexible indium tin oxide films prepared on stripe SiO 2 buffer layer-coated polymer substrates by magnetron sputtering

  • Zhi Nong Yu*
  • , Jian Jian Zhao
  • , Fan Xia
  • , Ze Jiang Lin
  • , Dong Pu Zhang
  • , Jian Leng
  • , Wei Xue
  • *Corresponding author for this work
  • Beijing Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

The electrical stability of flexible indium tin oxide (ITO) films fabricated on stripe SiO 2 buffer layer-coated polyethylene terephthalate (PET) substrates by magnetron sputtering was investigated by the bending test. The ITO thin films with stripe SiO 2 buffer layer under bending have better electrical stability than those with flat SiO 2 buffer layer and without buffer layer. Especially in inward bending text, the ITO thin films with stripe SiO 2 buffer layer only have a slight resistance change when the bending radius r is not less than 8 mm, while the resistances of the films with flat SiO 2 buffer layer and without buffer layer increase significantly at r = 16 mm with decreasing bending radius. This improvement of electrical stability in bending test is due to the small mismatch factor α in ITO-SiO 2 , the enhanced interface adhesion and the balance of residual stress. These results indicate that the stripe SiO 2 buffer layer is suited to enhance the electrical stability of flexible ITO film under bending.

Original languageEnglish
Pages (from-to)4807-4810
Number of pages4
JournalApplied Surface Science
Volume257
Issue number11
DOIs
Publication statusPublished - 15 Mar 2011
Externally publishedYes

Keywords

  • Buffer layer
  • Electrical properties
  • Indium tin oxide (ITO)
  • Magnetron sputtering

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