Electrochemical performance of CuO thin film deposited by RF reactive magnetron sputtering

Zhen Liu; Feng Wu; Fang Wang

Electrochemical performance of CuO thin film deposited by RF reactive magnetron sputtering

Zhen Liu^*
, Feng Wu
, Fang Wang

^*Corresponding author for this work

Beijing Institute of Technology
Tsinghua University

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

Copper oxide thin films were deposited on stainless substrates by reactive RF magnetron sputtering, use a copper target and an oxygen gas atmosphere. The films were characterised by XRD and AFM. The CuO thin films deposited at room temperature delivered higher capacity of 785μAh/(cm² · μm) in the first discharge process than the films deposited at 300°C, and the latter have better cycling reversibility. The AC impedance show that diffusion coefficient is about 2.46 × 10^-15cm²/s.

Original language	English
Pages (from-to)	1149-1151
Number of pages	3
Journal	Gongneng Cailiao/Journal of Functional Materials
Volume	38
Issue number	7
Publication status	Published - Jul 2007
Externally published	Yes

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

Keywords

CuO thin film
RF magnetron sputtering
Thin film lithium-ion battery

Cite this

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title = "Electrochemical performance of CuO thin film deposited by RF reactive magnetron sputtering",

abstract = "Copper oxide thin films were deposited on stainless substrates by reactive RF magnetron sputtering, use a copper target and an oxygen gas atmosphere. The films were characterised by XRD and AFM. The CuO thin films deposited at room temperature delivered higher capacity of 785μAh/(cm2 · μm) in the first discharge process than the films deposited at 300°C, and the latter have better cycling reversibility. The AC impedance show that diffusion coefficient is about 2.46 × 10-15cm2/s.",

keywords = "CuO thin film, RF magnetron sputtering, Thin film lithium-ion battery",

author = "Zhen Liu and Feng Wu and Fang Wang",

year = "2007",

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journal = "Gongneng Cailiao/Journal of Functional Materials",

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T1 - Electrochemical performance of CuO thin film deposited by RF reactive magnetron sputtering

AU - Liu, Zhen

AU - Wu, Feng

AU - Wang, Fang

PY - 2007/7

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N2 - Copper oxide thin films were deposited on stainless substrates by reactive RF magnetron sputtering, use a copper target and an oxygen gas atmosphere. The films were characterised by XRD and AFM. The CuO thin films deposited at room temperature delivered higher capacity of 785μAh/(cm2 · μm) in the first discharge process than the films deposited at 300°C, and the latter have better cycling reversibility. The AC impedance show that diffusion coefficient is about 2.46 × 10-15cm2/s.

AB - Copper oxide thin films were deposited on stainless substrates by reactive RF magnetron sputtering, use a copper target and an oxygen gas atmosphere. The films were characterised by XRD and AFM. The CuO thin films deposited at room temperature delivered higher capacity of 785μAh/(cm2 · μm) in the first discharge process than the films deposited at 300°C, and the latter have better cycling reversibility. The AC impedance show that diffusion coefficient is about 2.46 × 10-15cm2/s.

KW - CuO thin film

KW - RF magnetron sputtering

KW - Thin film lithium-ion battery

UR - https://www.scopus.com/pages/publications/34648840265

M3 - Article

AN - SCOPUS:34648840265

SN - 1001-9731

VL - 38

SP - 1149

EP - 1151

JO - Gongneng Cailiao/Journal of Functional Materials

JF - Gongneng Cailiao/Journal of Functional Materials

IS - 7

ER -

Electrochemical performance of CuO thin film deposited by RF reactive magnetron sputtering

Abstract

UN SDGs

Keywords

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