Effects of nitrogen and oxygen partial pressure on the structural and optical properties of ZnO:N thin films prepared by magnetron sputtering

Huiping Lu; Peipei Zhou; Haonan Liu; Linao Zhang; Yang Yu; Yinglan Li; Zhi Wang

doi:10.1016/j.matlet.2015.11.105

Effects of nitrogen and oxygen partial pressure on the structural and optical properties of ZnO:N thin films prepared by magnetron sputtering

Huiping Lu, Peipei Zhou, Haonan Liu, Linao Zhang, Yang Yu, Yinglan Li, Zhi Wang^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

19 Citations (Scopus)

Abstract

Nitrogen doped ZnO films were prepared by magnetron sputtering. We studied the influence of nitrogen partial pressure p_n and oxygen partial pressure p_o on the microstructure, morphology and optical properties of the thin films. The results show that different defects influence the structure and optical behavior of the films. Doping-related tensile stress turns compressive, owing to a different N-doping form in the films. Red-shift of absorption edge was observed with increasing p_n and decreasing p_o. Band-gap narrowing is improved by increasing nitrogen substitute and oxygen vacancies.

Original language	English
Pages (from-to)	123-126
Number of pages	4
Journal	Materials Letters
Volume	165
DOIs	https://doi.org/10.1016/j.matlet.2015.11.105
Publication status	Published - 15 Feb 2016
Externally published	Yes

Keywords

N-doping
Optical materials and properties
Sputtering
Thin films
ZnO

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10.1016/j.matlet.2015.11.105

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@article{bb245f2dcd644eb1942237115361c1c9,

title = "Effects of nitrogen and oxygen partial pressure on the structural and optical properties of ZnO:N thin films prepared by magnetron sputtering",

abstract = "Nitrogen doped ZnO films were prepared by magnetron sputtering. We studied the influence of nitrogen partial pressure pn and oxygen partial pressure po on the microstructure, morphology and optical properties of the thin films. The results show that different defects influence the structure and optical behavior of the films. Doping-related tensile stress turns compressive, owing to a different N-doping form in the films. Red-shift of absorption edge was observed with increasing pn and decreasing po. Band-gap narrowing is improved by increasing nitrogen substitute and oxygen vacancies.",

keywords = "N-doping, Optical materials and properties, Sputtering, Thin films, ZnO",

author = "Huiping Lu and Peipei Zhou and Haonan Liu and Linao Zhang and Yang Yu and Yinglan Li and Zhi Wang",

year = "2016",

month = feb,

day = "15",

doi = "10.1016/j.matlet.2015.11.105",

language = "English",

volume = "165",

pages = "123--126",

journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Effects of nitrogen and oxygen partial pressure on the structural and optical properties of ZnO:N thin films prepared by magnetron sputtering

AU - Lu, Huiping

AU - Zhou, Peipei

AU - Liu, Haonan

AU - Zhang, Linao

AU - Yu, Yang

AU - Li, Yinglan

AU - Wang, Zhi

PY - 2016/2/15

Y1 - 2016/2/15

N2 - Nitrogen doped ZnO films were prepared by magnetron sputtering. We studied the influence of nitrogen partial pressure pn and oxygen partial pressure po on the microstructure, morphology and optical properties of the thin films. The results show that different defects influence the structure and optical behavior of the films. Doping-related tensile stress turns compressive, owing to a different N-doping form in the films. Red-shift of absorption edge was observed with increasing pn and decreasing po. Band-gap narrowing is improved by increasing nitrogen substitute and oxygen vacancies.

AB - Nitrogen doped ZnO films were prepared by magnetron sputtering. We studied the influence of nitrogen partial pressure pn and oxygen partial pressure po on the microstructure, morphology and optical properties of the thin films. The results show that different defects influence the structure and optical behavior of the films. Doping-related tensile stress turns compressive, owing to a different N-doping form in the films. Red-shift of absorption edge was observed with increasing pn and decreasing po. Band-gap narrowing is improved by increasing nitrogen substitute and oxygen vacancies.

KW - N-doping

KW - Optical materials and properties

KW - Sputtering

KW - Thin films

KW - ZnO

UR - http://www.scopus.com/inward/record.url?scp=84948984021&partnerID=8YFLogxK

U2 - 10.1016/j.matlet.2015.11.105

DO - 10.1016/j.matlet.2015.11.105

M3 - Article

AN - SCOPUS:84948984021

SN - 0167-577X

VL - 165

SP - 123

EP - 126

JO - Materials Letters

JF - Materials Letters

ER -

Effects of nitrogen and oxygen partial pressure on the structural and optical properties of ZnO:N thin films prepared by magnetron sputtering

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Keywords

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