Design of EUVL camera with large numerical aperture

Yanqiu Li; Takeo Watanabe; Hiroo Kinoshita

Design of EUVL camera with large numerical aperture

Yanqiu Li^*
, Takeo Watanabe
, Hiroo Kinoshita

^*Corresponding author for this work

University of Hyogo

Research output: Contribution to journal › Conference article › peer-review

1 Citation (Scopus)

Abstract

A design of four mirror imaging optics has been presented. The optics is designed for 50 nm at the wavelength of 13.5 nm. The exposure field is 25 mm×0.5 mm on wafer. The astigmatism and the distortion are corrected well in the ring field. The study shows a potential solution of four-mirror camera with numerical aperture (NA)≥0.15 for extreme ultraviolet lithography (EUVL). The ring is still not large enough to meet the requirements of EUVL.

Original language	English
Pages (from-to)	759-764
Number of pages	6
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3997
Publication status	Published - 2000
Externally published	Yes
Event	Emerging Lithographic Technologies IV - Santa Clara, CA, USA Duration: 28 Feb 2000 → 1 Mar 2000

Cite this

@article{ffb636ec986e47b7979b9d251311f92e,

title = "Design of EUVL camera with large numerical aperture",

abstract = "A design of four mirror imaging optics has been presented. The optics is designed for 50 nm at the wavelength of 13.5 nm. The exposure field is 25 mm{\texttimes}0.5 mm on wafer. The astigmatism and the distortion are corrected well in the ring field. The study shows a potential solution of four-mirror camera with numerical aperture (NA)≥0.15 for extreme ultraviolet lithography (EUVL). The ring is still not large enough to meet the requirements of EUVL.",

author = "Yanqiu Li and Takeo Watanabe and Hiroo Kinoshita",

year = "2000",

language = "English",

volume = "3997",

pages = "759--764",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Emerging Lithographic Technologies IV ; Conference date: 28-02-2000 Through 01-03-2000",

}

TY - JOUR

T1 - Design of EUVL camera with large numerical aperture

AU - Li, Yanqiu

AU - Watanabe, Takeo

AU - Kinoshita, Hiroo

PY - 2000

Y1 - 2000

N2 - A design of four mirror imaging optics has been presented. The optics is designed for 50 nm at the wavelength of 13.5 nm. The exposure field is 25 mm×0.5 mm on wafer. The astigmatism and the distortion are corrected well in the ring field. The study shows a potential solution of four-mirror camera with numerical aperture (NA)≥0.15 for extreme ultraviolet lithography (EUVL). The ring is still not large enough to meet the requirements of EUVL.

AB - A design of four mirror imaging optics has been presented. The optics is designed for 50 nm at the wavelength of 13.5 nm. The exposure field is 25 mm×0.5 mm on wafer. The astigmatism and the distortion are corrected well in the ring field. The study shows a potential solution of four-mirror camera with numerical aperture (NA)≥0.15 for extreme ultraviolet lithography (EUVL). The ring is still not large enough to meet the requirements of EUVL.

UR - https://www.scopus.com/pages/publications/0033683766

M3 - Conference article

AN - SCOPUS:0033683766

SN - 0277-786X

VL - 3997

SP - 759

EP - 764

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Emerging Lithographic Technologies IV

Y2 - 28 February 2000 through 1 March 2000

ER -

Design of EUVL camera with large numerical aperture

Abstract

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