Design of electrostatic deflectors applied in DY-2001A electron beam lithography system

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	23
Number of pages	1
Journal	Weixi Jiagong Jishu/Microfabrication Technology
Issue number	1
Publication status	Published - Mar 2004
Externally published	Yes

Cite this

@article{2c5d5e6306ab4f02abbaa9cb5b454dfe,

title = "Design of electrostatic deflectors applied in DY-2001A electron beam lithography system",

author = "Liu, \{Zhu Ming\} and Gu, \{Wen Qi\} and Li, \{Yan Qiu\}",

year = "2004",

month = mar,

language = "English",

pages = "23",

journal = "Weixi Jiagong Jishu/Microfabrication Technology",

issn = "1003-8213",

publisher = "Weixi Jiagong Jishu",

number = "1",

}

TY - JOUR

T1 - Design of electrostatic deflectors applied in DY-2001A electron beam lithography system

AU - Liu, Zhu Ming

AU - Gu, Wen Qi

AU - Li, Yan Qiu

PY - 2004/3

Y1 - 2004/3

UR - https://www.scopus.com/pages/publications/2942679299

M3 - Article

AN - SCOPUS:2942679299

SN - 1003-8213

SP - 23

JO - Weixi Jiagong Jishu/Microfabrication Technology

JF - Weixi Jiagong Jishu/Microfabrication Technology

IS - 1

ER -