Design of electrostatic deflectors applied in DY-2001A electron beam lithography system

Zhu Ming Liu, Wen Qi Gu, Yan Qiu Li

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	23
Number of pages	1
Journal	Weixi Jiagong Jishu/Microfabrication Technology
Issue number	1
Publication status	Published - Mar 2004
Externally published	Yes

Cite this

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title = "Design of electrostatic deflectors applied in DY-2001A electron beam lithography system",

author = "Liu, {Zhu Ming} and Gu, {Wen Qi} and Li, {Yan Qiu}",

year = "2004",

month = mar,

language = "English",

pages = "23",

journal = "Weixi Jiagong Jishu/Microfabrication Technology",

issn = "1003-8213",

publisher = "Weixi Jiagong Jishu",

number = "1",

}

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T1 - Design of electrostatic deflectors applied in DY-2001A electron beam lithography system

AU - Liu, Zhu Ming

AU - Gu, Wen Qi

AU - Li, Yan Qiu

PY - 2004/3

Y1 - 2004/3

UR - http://www.scopus.com/inward/record.url?scp=2942679299&partnerID=8YFLogxK

M3 - Article

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SN - 1003-8213

SP - 23

JO - Weixi Jiagong Jishu/Microfabrication Technology

JF - Weixi Jiagong Jishu/Microfabrication Technology

IS - 1

ER -