@inproceedings{d54c57b39bed4b7aac20e54aaa2dc270,
title = "Design of an anamorphic extreme ultraviolet lithography projection objective adopted high order XY polynomial freeform surfaces",
abstract = "The design of high numerical aperture (NA0.55) anamorphic projection objective system is definitely difficult and important for extreme ultraviolet lithography (EUVL). The imaging performance of the anamorphic EUVL objective designs currently presented in the public literature does not meet the requirements of NA0.55 EUVL tools. In this paper, a NA0.55 anamorphic EUVL projection objective system is designed by optimizing with the high order XY polynomial freeform surfaces. The imaging performance reach the requirements of root mean square (RMS) wavefront error less than 0.84nm. Modulation transform function (MTF) is closer to the diffraction limit.",
keywords = "extreme ultraviolet lithography, freeform surface, high numerical aperture, optical design",
author = "Yanbei Nan and Zhenkun Zhang and Yanqiu Li",
note = "Publisher Copyright: {\textcopyright} 2025 SPIE.; 9th International Workshop on Advanced Patterning Solutions, IWAPS 2025 ; Conference date: 14-10-2025 Through 15-10-2025",
year = "2025",
month = dec,
day = "3",
doi = "10.1117/12.3092683",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Yayi Wei and Tianchun Ye",
booktitle = "Ninth International Workshop on Advanced Patterning Solutions, IWAPS 2025",
address = "United States",
}