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Cu on V2O3(0001) films: Growth and interaction

  • Wende Xiao
  • , Kan Xie
  • , Qinlin Guo*
  • , E. G. Wang
  • *Corresponding author for this work
  • CAS - Institute of Physics

Research output: Contribution to journalArticlepeer-review

Abstract

The deposition of Cu at room temperature on a V2O3(0001) surface, which was prepared on a Re(0001) substrate at first, is studied by XPS (X-ray photoelectron spectroscopy), UPS (ultraviolet photoelectron spectroscopy), and LEED (low-energy-electron diffraction). The XPS results indicate that the growth of Cu follows the patch-wise Stranski-Krastanov mode. Auger parameter and UPS show that at low coverages the deposited Cu has the Cu(I) state due to the interaction of Cu with V2O3 substrate; Cu becomes metallic at Cu coverage > 2 MLE (monolayer equivalent). The epitaxial Cu films on the V2O3(0001) have Cu(111)R30° superstructures observed by LEED.

Original languageEnglish
Pages (from-to)4721-4724
Number of pages4
JournalJournal of Physical Chemistry B
Volume106
Issue number18
DOIs
Publication statusPublished - 9 May 2002
Externally publishedYes

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