Critical Role of GIDL Current for Erase Operation in 3D Vertical FeFET and Compact Long-term FeFET Retention Model

  • Fei Mo
  • , Jiawen Xiang
  • , Xiaoran Mei*
  • , Yoshiki Sawabe
  • , Takuya Saraya
  • , Toshiro Hiramoto
  • , Chun Jung Su
  • , Vita Pi Ho Hu
  • , Masaharu Kobayashi
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

10 Citations (Scopus)

Abstract

We have investigated and revealed the critical role of GIDL current for efficient erase operation in 3D vertical FeFET by developing proper test structures and demonstrated a compact long-term FeFET retention model based on nucleation-limited switching, for the first time. We also proposed novel FeFET process for low voltage operation by controlling oxygen intrusion into the gate stack. This work contributes to the realization of high-density and low-power 3D vertical FeFET.

Original languageEnglish
Title of host publication2021 Symposium on VLSI Technology, VLSI Technology 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9784863487802
Publication statusPublished - 2021
Externally publishedYes
Event41st Symposium on VLSI Technology, VLSI Technology 2021 - Virtual, Online, Japan
Duration: 13 Jun 202119 Jun 2021

Publication series

NameDigest of Technical Papers - Symposium on VLSI Technology
Volume2021-June
ISSN (Print)0743-1562

Conference

Conference41st Symposium on VLSI Technology, VLSI Technology 2021
Country/TerritoryJapan
CityVirtual, Online
Period13/06/2119/06/21

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