TY - JOUR
T1 - Coupled Thermo-Mechanical analysis of 3D ICs Based on an Equivalent Modeling Methodology with Sub-Modeling
AU - Cheng, Zhiqiang
AU - Ding, Yingtao
AU - Zhang, Ziyue
AU - Zhou, Mingrui
AU - Chen, Zhiming
N1 - Publisher Copyright:
© 2013 IEEE.
PY - 2020
Y1 - 2020
N2 - The coupled thermo-mechanical field analysis of three-dimensional (3D) stacked integrated circuits (ICs) is evaluated by an efficient and accurate simulation strategy that combines equivalent homogenization modeling methodology and sub-modeling technique. The thermal field is first investigated using the proposed approach, and based on which the structural field is also examined through the calculation of warpage. The utilization of sub-modeling method reveals the local temperature and warpage distributions, which is lost or ignored by the conventional homogenization method. To validate the proposed method, the simulation results of a five-layer stacked integrated circuits are compared against true 3D results of the detailed model, where the maximum deviation for temperature and warpage is as low as 1.62% and 4.89%, respectively, which are greatly improved compared to 8.23% and 7.83% using traditional homogenization method. In addition, the total computation time is reduced by 76.7% in contrast to true 3D finite element analysis (FEa) simulation. Furthermore, the impacts of through-silicon-via (TSV) geometries, underfill and \mu -bump parameters on the temperature and warpage distributions are also studied to guide the design of 3D ICs with high performance and reliability.
AB - The coupled thermo-mechanical field analysis of three-dimensional (3D) stacked integrated circuits (ICs) is evaluated by an efficient and accurate simulation strategy that combines equivalent homogenization modeling methodology and sub-modeling technique. The thermal field is first investigated using the proposed approach, and based on which the structural field is also examined through the calculation of warpage. The utilization of sub-modeling method reveals the local temperature and warpage distributions, which is lost or ignored by the conventional homogenization method. To validate the proposed method, the simulation results of a five-layer stacked integrated circuits are compared against true 3D results of the detailed model, where the maximum deviation for temperature and warpage is as low as 1.62% and 4.89%, respectively, which are greatly improved compared to 8.23% and 7.83% using traditional homogenization method. In addition, the total computation time is reduced by 76.7% in contrast to true 3D finite element analysis (FEa) simulation. Furthermore, the impacts of through-silicon-via (TSV) geometries, underfill and \mu -bump parameters on the temperature and warpage distributions are also studied to guide the design of 3D ICs with high performance and reliability.
KW - Three-dimensional integrated circuits
KW - coupled thermo-mechanical analysis
KW - equivalent homogenization modeling
KW - sub-modeling technique
KW - through-silicon-via
UR - http://www.scopus.com/inward/record.url?scp=85079818069&partnerID=8YFLogxK
U2 - 10.1109/aCCESS.2020.2966789
DO - 10.1109/aCCESS.2020.2966789
M3 - Article
AN - SCOPUS:85079818069
SN - 2169-3536
VL - 8
SP - 14146
EP - 14154
JO - IEEE Access
JF - IEEE Access
M1 - 8960386
ER -