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Black photopolymer and fabrication of blackmatrix

  • Jinmei Fu*
  • , Yong Li
  • , Jinliang Guo
  • , Hongjin Gao
  • *Corresponding author for this work
  • Tsinghua University

Research output: Contribution to journal › Conference article › peer-review

Abstract

A water-soluble black photopolymer, containing PVA-SbQ, carbon black, surfactants and solvent, was developed for production of blackmatrix. Blackmatrix made from the black photopolymer has high opacity and good resolution. The negative charged carbon black is more suitable to be used as the light shielding substance. Several methods to shorten the exposure time were studied and discussed. Increasing the content of photosensitive group and exposed by lamp of high irradiation intensity are effective methods to shorten the exposure time. The fabrication of BM using this black photopolymer has some advantages over conventional methods: low cost, low light reflectivity and low pollution.

Original languageEnglish
Pages (from-to)64-69
Number of pages6
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3560
DOIs
Publication statusPublished - 1998
Externally publishedYes
EventDisplay Devices and Systems II - Beijing, China
Duration: 16 Sept 1998 → 17 Sept 1998

Keywords

  • Black photopolymer
  • Blackmatrix
  • Liquid crystal display

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