TY - JOUR
T1 - Arrays of horizontal semiconducting carbon nanotubes grown from non-metal catalysts prepared by a “thermophoresis-anchoring” synergistic strategy
AU - Lin, Sizhe
AU - Ye, Tao
AU - Zhang, Xinyu
AU - Zuo, Hui
AU - Zhu, Linxi
AU - Wang, Xiuxia
AU - Li, Changlong
AU - Yang, Zhi
AU - Du, Ran
AU - Lin, Dewu
AU - Hu, Yue
N1 - Publisher Copyright:
© 2024 Elsevier Ltd
PY - 2025/4
Y1 - 2025/4
N2 - The fabrication of uncontaminated single-walled carbon nanotube (SWNT) horizontal arrays is crucial for the development of carbon-based nanoelectronics. However, chemical vapor deposition (CVD) using transition metal catalysts, one of the main methods for preparing SWNT arrays, leaves a significant amount of metal impurities. Here, we report a synergistic thermophoresis-anchoring strategy to prepare uniformly dispersed and size-controllable non-metal SiOx catalysts for the growth of horizontal SWNT arrays. The pyrolysis of silicon-based precursors generates an abundant supply of SiOx particles, which are deposited bottom-up onto the quartz substrate due to the thermal buoyancy induced by a rapid temperature increase. Meanwhile, Surface reconstruction promoted by mechanical force creates numerous anchoring sites on the quartz substrate. This facilitates the capture of catalysts and suppresses their migration and aggregation, thereby promoting the uniform deposition of small-sized catalysts. Consequently, SWNT arrays with a density of 9 tubes per micron are synthesized using these nonmetal SiOx catalysts. Importantly, Raman spectroscopy and electrical characterization reveal a semiconductor ratio of up to 94 % for the directly grown SWNT arrays, which is attributed to an in situ etching mechanism within the confined space. This work provides a viable way to promote the practical application of next-generation carbon-based nanodevices.
AB - The fabrication of uncontaminated single-walled carbon nanotube (SWNT) horizontal arrays is crucial for the development of carbon-based nanoelectronics. However, chemical vapor deposition (CVD) using transition metal catalysts, one of the main methods for preparing SWNT arrays, leaves a significant amount of metal impurities. Here, we report a synergistic thermophoresis-anchoring strategy to prepare uniformly dispersed and size-controllable non-metal SiOx catalysts for the growth of horizontal SWNT arrays. The pyrolysis of silicon-based precursors generates an abundant supply of SiOx particles, which are deposited bottom-up onto the quartz substrate due to the thermal buoyancy induced by a rapid temperature increase. Meanwhile, Surface reconstruction promoted by mechanical force creates numerous anchoring sites on the quartz substrate. This facilitates the capture of catalysts and suppresses their migration and aggregation, thereby promoting the uniform deposition of small-sized catalysts. Consequently, SWNT arrays with a density of 9 tubes per micron are synthesized using these nonmetal SiOx catalysts. Importantly, Raman spectroscopy and electrical characterization reveal a semiconductor ratio of up to 94 % for the directly grown SWNT arrays, which is attributed to an in situ etching mechanism within the confined space. This work provides a viable way to promote the practical application of next-generation carbon-based nanodevices.
KW - High density
KW - Non-metal catalyst
KW - Semiconducting
KW - Single-walled carbon nanotube arrays
KW - Thermophoresis - anchoring
UR - http://www.scopus.com/inward/record.url?scp=85209879762&partnerID=8YFLogxK
U2 - 10.1016/j.nantod.2024.102562
DO - 10.1016/j.nantod.2024.102562
M3 - Article
AN - SCOPUS:85209879762
SN - 1748-0132
VL - 61
JO - Nano Today
JF - Nano Today
M1 - 102562
ER -