Analyzing in-plane magnetic anisotropy from surface morphology for amorphous films

B. Fan; F. Zeng; X. W. Li; F. Lv; F. Pan; X. Y. Li; Y. Cao

doi:10.1016/j.apsusc.2008.04.104

Analyzing in-plane magnetic anisotropy from surface morphology for amorphous films

B. Fan
, F. Zeng^*
, X. W. Li
, F. Lv
, F. Pan
, X. Y. Li
, Y. Cao

^*Corresponding author for this work

Tsinghua University
Bank of China

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

A method is developed to analyze the in-plane magnetic anisotropy from surface morphology for amorphous films. The lateral sizes along radial direction (R _RD ) and tangent direction (R _TD ) of rotational substrate, which are extracted from the surface morphology of Co _66.3 Zr _33.7 amorphous films, are used to calculate stress anisotropy energy E _σ . It is found that E _σ is consistent with the magnetic anisotropy energy K _μ for the samples deposited on Si (1 0 0) substrate and then a relationship K _μ ∝ 1/R _RD - 1/R _TD can be obtained. This method is sensitive to the initial state of substrate so its application range is discussed.

Original language	English
Pages (from-to)	6928-6931
Number of pages	4
Journal	Applied Surface Science
Volume	254
Issue number	21
DOIs	https://doi.org/10.1016/j.apsusc.2008.04.104
Publication status	Published - 30 Aug 2008
Externally published	Yes

Keywords

Amorphous films
Magnetic anisotropy
Surface morphology
Surface stress

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10.1016/j.apsusc.2008.04.104

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title = "Analyzing in-plane magnetic anisotropy from surface morphology for amorphous films",

abstract = " A method is developed to analyze the in-plane magnetic anisotropy from surface morphology for amorphous films. The lateral sizes along radial direction (R RD ) and tangent direction (R TD ) of rotational substrate, which are extracted from the surface morphology of Co 66.3 Zr 33.7 amorphous films, are used to calculate stress anisotropy energy E σ . It is found that E σ is consistent with the magnetic anisotropy energy K μ for the samples deposited on Si (1 0 0) substrate and then a relationship K μ ∝ 1/R RD - 1/R TD can be obtained. This method is sensitive to the initial state of substrate so its application range is discussed.",

keywords = "Amorphous films, Magnetic anisotropy, Surface morphology, Surface stress",

author = "B. Fan and F. Zeng and Li, \{X. W.\} and F. Lv and F. Pan and Li, \{X. Y.\} and Y. Cao",

year = "2008",

month = aug,

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doi = "10.1016/j.apsusc.2008.04.104",

language = "English",

volume = "254",

pages = "6928--6931",

journal = "Applied Surface Science",

issn = "0169-4332",

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TY - JOUR

T1 - Analyzing in-plane magnetic anisotropy from surface morphology for amorphous films

AU - Fan, B.

AU - Zeng, F.

AU - Li, X. W.

AU - Lv, F.

AU - Pan, F.

AU - Li, X. Y.

AU - Cao, Y.

PY - 2008/8/30

Y1 - 2008/8/30

N2 - A method is developed to analyze the in-plane magnetic anisotropy from surface morphology for amorphous films. The lateral sizes along radial direction (R RD ) and tangent direction (R TD ) of rotational substrate, which are extracted from the surface morphology of Co 66.3 Zr 33.7 amorphous films, are used to calculate stress anisotropy energy E σ . It is found that E σ is consistent with the magnetic anisotropy energy K μ for the samples deposited on Si (1 0 0) substrate and then a relationship K μ ∝ 1/R RD - 1/R TD can be obtained. This method is sensitive to the initial state of substrate so its application range is discussed.

AB - A method is developed to analyze the in-plane magnetic anisotropy from surface morphology for amorphous films. The lateral sizes along radial direction (R RD ) and tangent direction (R TD ) of rotational substrate, which are extracted from the surface morphology of Co 66.3 Zr 33.7 amorphous films, are used to calculate stress anisotropy energy E σ . It is found that E σ is consistent with the magnetic anisotropy energy K μ for the samples deposited on Si (1 0 0) substrate and then a relationship K μ ∝ 1/R RD - 1/R TD can be obtained. This method is sensitive to the initial state of substrate so its application range is discussed.

KW - Amorphous films

KW - Magnetic anisotropy

KW - Surface morphology

KW - Surface stress

UR - https://www.scopus.com/pages/publications/49549084355

U2 - 10.1016/j.apsusc.2008.04.104

DO - 10.1016/j.apsusc.2008.04.104

M3 - Article

AN - SCOPUS:49549084355

SN - 0169-4332

VL - 254

SP - 6928

EP - 6931

JO - Applied Surface Science

JF - Applied Surface Science

IS - 21

ER -

Analyzing in-plane magnetic anisotropy from surface morphology for amorphous films

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Keywords

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