Analysis of residual stress of gradient TiAlN films prepared by arc ion plating

Shi Wei Yang; Li Yun Zeng; Yan Hua Wang; Hai Tao Liu

Analysis of residual stress of gradient TiAlN films prepared by arc ion plating

Shi Wei Yang^*, Li Yun Zeng, Yan Hua Wang, Hai Tao Liu

^*Corresponding author for this work

Harbin Engineering University

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Graded (Ti, Al)N film was prepared on 1Cr11Ni2W2MoV stainless steel by arc ion plating. High temperature oxidation experiments were carried out at 700°C and 800°C. The residual stress configuration and bonding state of gradient film were analyzed. The results show that residual stress of films decreases obviously because there are five monolayers in the gradient films. Composition of these monolayers is Ti, TiN, TV, , Al_0.25N, Ti_0.6Al_0.4N, Ti_0.5Al_0.5N. The composition and structure gradients contribute to the decrease of lattice mismatch and reduction of thermal expansion coefficient misfit leading to the decrease of residual stress. At high temperature, intrinsic stress relaxes and the thermal stress changes to tensile stress. The bonding states of gradient TiAIN film at room temperature and high temperature are excellent.

Original language	English
Pages (from-to)	100-103
Number of pages	4
Journal	Cailiao Rechuli Xuebao/Transactions of Materials and Heat Treatment
Volume	27
Issue number	3
Publication status	Published - Jun 2006
Externally published	Yes

Keywords

(Ti, Al)N gradient films
Arc ion plating
Residual stress

Cite this

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title = "Analysis of residual stress of gradient TiAlN films prepared by arc ion plating",

abstract = "Graded (Ti, Al)N film was prepared on 1Cr11Ni2W2MoV stainless steel by arc ion plating. High temperature oxidation experiments were carried out at 700°C and 800°C. The residual stress configuration and bonding state of gradient film were analyzed. The results show that residual stress of films decreases obviously because there are five monolayers in the gradient films. Composition of these monolayers is Ti, TiN, TV, , Al0.25N, Ti0.6Al0.4N, Ti0.5Al0.5N. The composition and structure gradients contribute to the decrease of lattice mismatch and reduction of thermal expansion coefficient misfit leading to the decrease of residual stress. At high temperature, intrinsic stress relaxes and the thermal stress changes to tensile stress. The bonding states of gradient TiAIN film at room temperature and high temperature are excellent.",

keywords = "(Ti, Al)N gradient films, Arc ion plating, Residual stress",

author = "Yang, {Shi Wei} and Zeng, {Li Yun} and Wang, {Yan Hua} and Liu, {Hai Tao}",

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month = jun,

language = "English",

volume = "27",

pages = "100--103",

journal = "Cailiao Rechuli Xuebao/Transactions of Materials and Heat Treatment",

issn = "1009-6264",

publisher = "Chinese Mechanical Engineering Society",

number = "3",

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TY - JOUR

T1 - Analysis of residual stress of gradient TiAlN films prepared by arc ion plating

AU - Yang, Shi Wei

AU - Zeng, Li Yun

AU - Wang, Yan Hua

AU - Liu, Hai Tao

PY - 2006/6

Y1 - 2006/6

N2 - Graded (Ti, Al)N film was prepared on 1Cr11Ni2W2MoV stainless steel by arc ion plating. High temperature oxidation experiments were carried out at 700°C and 800°C. The residual stress configuration and bonding state of gradient film were analyzed. The results show that residual stress of films decreases obviously because there are five monolayers in the gradient films. Composition of these monolayers is Ti, TiN, TV, , Al0.25N, Ti0.6Al0.4N, Ti0.5Al0.5N. The composition and structure gradients contribute to the decrease of lattice mismatch and reduction of thermal expansion coefficient misfit leading to the decrease of residual stress. At high temperature, intrinsic stress relaxes and the thermal stress changes to tensile stress. The bonding states of gradient TiAIN film at room temperature and high temperature are excellent.

AB - Graded (Ti, Al)N film was prepared on 1Cr11Ni2W2MoV stainless steel by arc ion plating. High temperature oxidation experiments were carried out at 700°C and 800°C. The residual stress configuration and bonding state of gradient film were analyzed. The results show that residual stress of films decreases obviously because there are five monolayers in the gradient films. Composition of these monolayers is Ti, TiN, TV, , Al0.25N, Ti0.6Al0.4N, Ti0.5Al0.5N. The composition and structure gradients contribute to the decrease of lattice mismatch and reduction of thermal expansion coefficient misfit leading to the decrease of residual stress. At high temperature, intrinsic stress relaxes and the thermal stress changes to tensile stress. The bonding states of gradient TiAIN film at room temperature and high temperature are excellent.

KW - (Ti, Al)N gradient films

KW - Arc ion plating

KW - Residual stress

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M3 - Article

AN - SCOPUS:33747848951

SN - 1009-6264

VL - 27

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JO - Cailiao Rechuli Xuebao/Transactions of Materials and Heat Treatment

JF - Cailiao Rechuli Xuebao/Transactions of Materials and Heat Treatment

IS - 3

ER -

Analysis of residual stress of gradient TiAlN films prepared by arc ion plating

Abstract

Keywords

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