Abstract
This letter presents the design and validation of an ultrawideband microwave reflection sensor for plasma environment data acquisition. The sensor employs a four-ridged horn antenna covering the 2 GHz to 26.5 GHz frequency band, enabling broadband interaction with plasmas having electron densities in the range of 1010 cm-3 to 1012 cm-3. The antenna structure integrates high-temperature-resistant materials, allowing stable operation under thermal conditions up to 1000 K. Reflection measurements and full-wave simulations are performed under multiple plasma environments to evaluate the sensor's response characteristics. The results indicate that the proposed design enables nonintrusive and broadband acquisition of reflection data in varying plasma conditions. This approach provides a viable solution for in-situ sensing of plasma environments in high-speed aerospace and other demanding conditions.
| Original language | English |
|---|---|
| Pages (from-to) | 2993-2997 |
| Number of pages | 5 |
| Journal | IEEE Antennas and Wireless Propagation Letters |
| Volume | 25 |
| Issue number | 7 |
| DOIs | |
| Publication status | Published - 1 Jul 2026 |
| Externally published | Yes |
Keywords
- Electromagnetic sensor
- microwave reflection
- nonintrusive data acquisition
- plasma environment
- ultrawideband antenna
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