Allocation method of micromirror array for deep ultraviolet illumination system

Yuqing Chen, Yanbei Nan, Tong Li, Zhenkun Zhang, Yanqiu Li*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Source and mask optimization (SMO) is a crucial resolution enhancement technique for 28nm technology node and beyond in lithography. The allocation method of micromirror array (MMA) is the key to produce the freeform illumination source. The generated illumination source is affected by the computation speed and accuracy of the allocation method. In this paper, an allocation method of micromirror array for deep ultraviolet illumination system is proposed. The computation speed of the proposed method is faster than the traditional method. The experimental results show that the computation efficiency of the proposed method has been improved by at least 50%.

Original languageEnglish
Title of host publicationEighth International Workshop on Advanced Patterning Solutions, IWAPS 2024
EditorsYayi Wei, Tianchun Ye
PublisherSPIE
ISBN (Electronic)9781510686328
DOIs
Publication statusPublished - 2024
Externally publishedYes
Event8th International Workshop on Advanced Patterning Solutions, IWAPS 2024 - Jiaxing, China
Duration: 15 Oct 202416 Oct 2024

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume13423
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference8th International Workshop on Advanced Patterning Solutions, IWAPS 2024
Country/TerritoryChina
CityJiaxing
Period15/10/2416/10/24

Keywords

  • computation speed
  • illumination source
  • micromirror array
  • SMO

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