TY - JOUR
T1 - All-reflective optical system design for extreme ultraviolet lithography
AU - Chang, Jun
AU - Zou, Meifang
AU - Wang, Ruirui
AU - Feng, Shulong
AU - Talha, M. M.
PY - 2010/11
Y1 - 2010/11
N2 - All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL). In this letter, we present a design for an all-reflective lithographic projection lens. We also discuss its design idea and structural system. After analysis of the four-mirror optical system, the initial structural parameters are determined, the optical system is optimized, and the tolerances of the system are analyzed. We also show the implementation of optimal layout and desired imaging performance.
AB - All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL). In this letter, we present a design for an all-reflective lithographic projection lens. We also discuss its design idea and structural system. After analysis of the four-mirror optical system, the initial structural parameters are determined, the optical system is optimized, and the tolerances of the system are analyzed. We also show the implementation of optimal layout and desired imaging performance.
UR - http://www.scopus.com/inward/record.url?scp=78650026027&partnerID=8YFLogxK
U2 - 10.3788/COL20100811.1082
DO - 10.3788/COL20100811.1082
M3 - Article
AN - SCOPUS:78650026027
SN - 1671-7694
VL - 8
SP - 1082
EP - 1084
JO - Chinese Optics Letters
JF - Chinese Optics Letters
IS - 11
ER -