TY - JOUR
T1 - Advances in Quantum Dot Direct Photolithographic Patterning
AU - Qiu, Yanyan
AU - Yu, Yixin
AU - Wang, Shanshan
AU - Chen, Menglu
N1 - Publisher Copyright:
© 2024 American Chemical Society.
PY - 2024/7/1
Y1 - 2024/7/1
N2 - Quantum Dots (QDs) with unique electrical and optical properties have wide applications on patterned or pixelated devices such as display devices, integrated photoelectric devices, etc. However, conventional patterning methods have some obvious drawbacks such as complex processing, blurred film boundaries, and degradation on the photophysical properties. Recently, direct photolithographic patterning has appeared as a novel strategy to realize high-resolution patterning solids and high-performance patterned devices. In this review, we summarize the research progress on the direct photolithographic patterning on QDs as well as their applications. We also discuss the current challenges and future development in this field.
AB - Quantum Dots (QDs) with unique electrical and optical properties have wide applications on patterned or pixelated devices such as display devices, integrated photoelectric devices, etc. However, conventional patterning methods have some obvious drawbacks such as complex processing, blurred film boundaries, and degradation on the photophysical properties. Recently, direct photolithographic patterning has appeared as a novel strategy to realize high-resolution patterning solids and high-performance patterned devices. In this review, we summarize the research progress on the direct photolithographic patterning on QDs as well as their applications. We also discuss the current challenges and future development in this field.
UR - http://www.scopus.com/inward/record.url?scp=85196724512&partnerID=8YFLogxK
U2 - 10.1021/acsmaterialslett.4c00762
DO - 10.1021/acsmaterialslett.4c00762
M3 - Review article
AN - SCOPUS:85196724512
SN - 2639-4979
VL - 6
SP - 3176
EP - 3189
JO - ACS Materials Letters
JF - ACS Materials Letters
IS - 7
ER -