TY - GEN
T1 - Advanced lithography technology in IEECAS
AU - Li, Yanqiu
PY - 2006
Y1 - 2006
N2 - Semiconductor Industry of China is attracting much attention. Advanced lithography is a critical technology employed in the semiconductor industry. Study of next generation lithography is very active but less explored in China. In this paper, the advanced lithography activity in IEECAS is presented. The Immersion ArF lithography and extreme ultraviolet lithography (EUVL) are studied for 65 nm node and below by using PROLITH9.0.1, ProData 1.4.2, ProLE3.2.6 and In- house software MicroCruiser3.0 because the simulation of lithography is indispensable tools for lithographic technology development in four important areas: as a research tool, as a development tool, as a manufacturing tool and as a learning tool, that has been used in our research activities. The study is traced from the lithography equipment to 1C design and resolution enhancement technology (RET), such as: phase shift technology, off-axis illumination, immersion (Hyper-NA) technology and polarization technology. The results are significant for co-design of lithography equipment, IC design and manufacture.
AB - Semiconductor Industry of China is attracting much attention. Advanced lithography is a critical technology employed in the semiconductor industry. Study of next generation lithography is very active but less explored in China. In this paper, the advanced lithography activity in IEECAS is presented. The Immersion ArF lithography and extreme ultraviolet lithography (EUVL) are studied for 65 nm node and below by using PROLITH9.0.1, ProData 1.4.2, ProLE3.2.6 and In- house software MicroCruiser3.0 because the simulation of lithography is indispensable tools for lithographic technology development in four important areas: as a research tool, as a development tool, as a manufacturing tool and as a learning tool, that has been used in our research activities. The study is traced from the lithography equipment to 1C design and resolution enhancement technology (RET), such as: phase shift technology, off-axis illumination, immersion (Hyper-NA) technology and polarization technology. The results are significant for co-design of lithography equipment, IC design and manufacture.
KW - EUVL
KW - Immersion ArF lithography
KW - Resolution enhancement technology
KW - Simulation
UR - http://www.scopus.com/inward/record.url?scp=33748980951&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:33748980951
SN - 1566774373
SN - 9781566774376
T3 - Proceedings - Electrochemical Society
SP - 630
EP - 643
BT - Proceedings of the 5th International Conference on Semiconductor Technology, ISTC 2006
T2 - 5th International Conference on Semiconductor Technology, ISTC 2006
Y2 - 21 March 2006 through 23 March 2006
ER -