Advanced Electromagnetic Compatibility Research for Semiconductor Manufacturing Equipment Based on a Multi-level Suppression Structure

As the complexity of semiconductor manufacturing equipment increases, the issue of electromagnetic interference (EMI) has become more severe, affecting the normal operation of equipment and the quality of products. This study proposes an electromagnetic compatibility (EMC) optimization scheme based on a multi-level suppression structure. By integrating sensor networks, machine learning algorithms, and intelligent control technologies, the scheme enables real-time monitoring and dynamic suppression of the electromagnetic environment surrounding the equipment. Through the coordinated efforts at multiple levels-interference sources, transmission paths, and receiving ends-this approach significantly enhances the equipment’s resistance to interference. Experimental results demonstrate that this method can substantially reduce the impact of electromagnetic interference, improving the overall EMC performance of the equipment, thus providing effective technical support for the semiconductor manufacturing industry.