A Single-Crystal Antimony Trioxide Dielectric for 2D Field-Effect Transistors

Dainan Wang, Weikang Dong, Ping Wang, Qingmei Hu, Dian Li, Lu Lv, Yang Yang, Lin Jia, Rui Na, Shoujun Zheng, Jinshui Miao, Hui Sun*, Yan Xiong*, Jiadong Zhou*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The remarkable potential of two-dimensional (2D) materials in sustaining Moore's law has sparked a research frenzy. Extensive efforts have been made in the research of utilizing 2D semiconductors as channel materials in field-effect transistors. However, the next generation of integrated devices requires the integration of gate dielectrics with wider bandgaps and higher dielectric constants. Here, insulating α-Sb2O3 single-crystal nanosheets are synthesized by one-step chemical vapor deposition method. Importantly, the α-Sb2O3 single-crystal dielectric exhibits a high dielectric constant of 11.8 and a wide bandgap of 3.78 eV. Besides, the atomically smooth interface between α-Sb2O3 and MoS2 enables the fabrication of dual-gated field-effect transistors with the top gate dielectric of α-Sb2O3 nanosheets. The field-effect transistors exhibit a switching ratio of exceeding 108, which achieves the manipulation of field-effect transistors by using 2D dielectric materials. These results hold significant implications for optimizing the performances of 2D devices and innovating microelectronics.

Original languageEnglish
Article number2402689
JournalSmall
Volume21
Issue number1
DOIs
Publication statusPublished - 8 Jan 2025

Keywords

  • 2D field-effect transistors
  • 2D materials
  • chemical vapor deposition
  • dielectric
  • α-SbO

Fingerprint

Dive into the research topics of 'A Single-Crystal Antimony Trioxide Dielectric for 2D Field-Effect Transistors'. Together they form a unique fingerprint.

Cite this