A self-aligned mask-free fabrication process for high-frequency ZnO array transducer

J. Y. Zhang, W. J. Xu, J. Carlier, E. Moulin, D. Remiens, X. M. Ji, Y. P. Huang, S. M. Chen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

High-frequency ultrasonic array transducers are essential for high resolution imaging in clinical analysis and Non Destructive Evaluation (NDE). However, the fabrication of piezoelectric array transducers is a great challenge due to the small features in elaborating piezoelectric array films. This paper describes a MEMS based self-aligned mask-free process for fabrication of ZnO linear array transducers of more than 100MHz. A four-step-rotation deposition approach is proposed and investigated, that improves the lateral growth in ZnO array deposition. The ratio of vertical to lateral growth is improved by 40% compared to one-step deposition method. The results prove that the reduction of the lateral growth helps to achieve full-kerfed ZnO array with smaller pitch.

Original languageEnglish
Title of host publication2012 IEEE International Ultrasonics Symposium, IUS 2012
Pages1806-1809
Number of pages4
DOIs
Publication statusPublished - 2012
Externally publishedYes
Event2012 IEEE International Ultrasonics Symposium, IUS 2012 - Dresden, Germany
Duration: 7 Oct 201210 Oct 2012

Publication series

NameIEEE International Ultrasonics Symposium, IUS
ISSN (Print)1948-5719
ISSN (Electronic)1948-5727

Conference

Conference2012 IEEE International Ultrasonics Symposium, IUS 2012
Country/TerritoryGermany
CityDresden
Period7/10/1210/10/12

Fingerprint

Dive into the research topics of 'A self-aligned mask-free fabrication process for high-frequency ZnO array transducer'. Together they form a unique fingerprint.

Cite this