Personal profile
Personal profile
Gender: Male
Title: Professor
Education: Doctor
Discipline: Optical Engineering
Research interests: Advanced lithography, Computational lithography, Image Processing and Signal Processing
E-mail: maxu@bit.edu.cn Office phone: 010-68912946
Ma Xu, male, Doctor, professor. In 2005, he received his bachelor's degree from the Department of Electronic Engineering of Tsinghua University. He received his Ph.D. in Electrical and Computer Engineering from the University of Delaware in 2009. From 2009 to 2010, he was a postdoctoral researcher at the University of California, Berkeley. Since 2010, he has worked as an associate professor in the School of Optoelectronics, Beijing Institute of Technology. He was promoted to full professor in 2013. His research interests include advanced lithography, computational lithography, image processing and signal processing. In 2010, he was selected into the "New Century Outstanding Talents Support Program" of the Ministry of Education, in 2012, he was selected into the "Science and Technology Activity Project Funding Program for Overseas Students" of the Ministry of Personnel, in 2013, he was selected into the "Beijing Institute of Technology Science and Technology Innovation Plan Major Project Cultivation Special Plan", in 2010, he was selected into the "Beijing Institute of Technology Outstanding Young Teachers Funding Program", in 2010, he received the Allan P. Colburn Prize - for the Outstanding Doctoral Dissertation in Mathematical Sciences and Sciences from the University of Delaware He received the Signal Processing & Communication Graduate Faculty Award from the University of Delaware in 2009.
Title: Professor
Education: Doctor
Discipline: Optical Engineering
Research interests: Advanced lithography, Computational lithography, Image Processing and Signal Processing
E-mail: maxu@bit.edu.cn Office phone: 010-68912946
Ma Xu, male, Doctor, professor. In 2005, he received his bachelor's degree from the Department of Electronic Engineering of Tsinghua University. He received his Ph.D. in Electrical and Computer Engineering from the University of Delaware in 2009. From 2009 to 2010, he was a postdoctoral researcher at the University of California, Berkeley. Since 2010, he has worked as an associate professor in the School of Optoelectronics, Beijing Institute of Technology. He was promoted to full professor in 2013. His research interests include advanced lithography, computational lithography, image processing and signal processing. In 2010, he was selected into the "New Century Outstanding Talents Support Program" of the Ministry of Education, in 2012, he was selected into the "Science and Technology Activity Project Funding Program for Overseas Students" of the Ministry of Personnel, in 2013, he was selected into the "Beijing Institute of Technology Science and Technology Innovation Plan Major Project Cultivation Special Plan", in 2010, he was selected into the "Beijing Institute of Technology Outstanding Young Teachers Funding Program", in 2010, he received the Allan P. Colburn Prize - for the Outstanding Doctoral Dissertation in Mathematical Sciences and Sciences from the University of Delaware He received the Signal Processing & Communication Graduate Faculty Award from the University of Delaware in 2009.
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A deep estimation-enhancement unfolding framework for hyperspectral image reconstruction
Fang, Z., Ma, X. & Arce, G. R., Jan 2026, In: Infrared Physics and Technology. 153, 106282.Research output: Contribution to journal › Article › peer-review
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Resolution enhancement via an unfolding network with a deblocking module and DCN for infrared small block-based compressive imaging
Zhao, J., Hao, X., Ma, X. & Ke, J., 1 Jan 2026, In: Chinese Optics Letters. 24, 1, 11103.Research output: Contribution to journal › Article › peer-review
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A fast mask three-dimensional model based on multi-directional filtering
Liu, S. & Ma, X., 15 Aug 2025, Fourth International Conference on Optics and Machine Vision, ICOMV 2025. Liu, F. & Xue, C. (eds.). SPIE, 137321E. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13732).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
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A Two-Stage Unet Framework for Sub-Resolution Assist Feature Prediction
Lin, M., Ma, L., Dong, L. & Ma, X., Nov 2025, In: Micromachines. 16, 11, 1301.Research output: Contribution to journal › Article › peer-review
Open Access -
Block-based inverse lithography technology with adaptive level-set algorithm
Huang, C., Ma, X., Zhang, S., Lin, M., Porras-Díaz, N. & Arce, G. R., Apr 2025, In: Optics and Laser Technology. 182, 112211.Research output: Contribution to journal › Article › peer-review
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